Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 31, 2010
Patent Application Number
11563947
Date Filed
November 28, 2006
Patent Primary Examiner
Patent abstract
A method for processing substrates to manufacture semiconductor structures thereon includes analyzing at least one first processing parameter of a first apparatus for processing a substrate, thereby yielding at least one first throughput rate of the first apparatus. At least one second processing parameter of a second apparatus is analyzed for processing the substrate, thereby yielding at least one second throughput rate of the second apparatus. The first throughput rate and the second throughput rate are compared, thereby yielding at least one comparison result for processing the substrate.
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