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US Patent 7780877 High-frequency substrate and production method therefor

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Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7780877
Patent Inventor Names
Noriaki Seko0
Eiji Sakata0
Masao Tamada0
Naoki Itoh0
Date of Patent
August 24, 2010
Patent Application Number
12096873
Date Filed
December 5, 2006
Patent Primary Examiner
‌
Douglas Mc Ginty
Patent abstract

The high-frequency substrate is constructed of a base member and a conductor adhered to the base member, and the base member is composed of a polymer which is a fluoropolymer having a conductor-affinitive monomer graftpolymerized at a grafting percentage of 1% or less by weight. After reactive sites necessary for graftpolymerization are formed on a film of a fluoropolymer under an oxygen-free atmosphere by irradiating the film with an electron beam or the like, the fluoropolymer film is introduced into a solution of a conductor-affinitive monomer so as to cause graftpolymerization, and a conductor is adhered thereto to thereby produce a substrate, with a grafting percentage of the monomer to the fluoropolymer being 1% or less by weight in the graftpolymerization. The technique leads to the production of a high-frequency substrate having superior adhesion force with respect to the conductor.

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