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US Patent 7779777 Substrate processing apparatus and method

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Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7779777
Patent Inventor Names
Eishi Shiobara1
Hirokazu Kato1
Seiro Miyoshi1
Shinichi Ito1
Date of Patent
August 24, 2010
Patent Application Number
12466525
Date Filed
May 15, 2009
Patent Primary Examiner
‌
Yewebdar T Tadesse
Patent abstract

A substrate-processing apparatus includes a sample table which mounts thereon a to-be-processed substrate, a first line which supplies a chemical solution, a second line which supplies a cleaning liquid, a three-way valve connected to the first and second lines and configured to select one of the first and second lines, a filter provided across the first line upstream of the three-way valve, and configured to eliminate a foreign material from the chemical solution, and a nozzle provided downstream of the three-way valve and configured to discharge the chemical solution or the cleaning liquid when the first or second line is selected via the three-way valve. The three-way valve selects the first line when the substrate is coated with the chemical solution, and selects the second line in other cases.

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