Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Nicolas Loubet0
Alexandre Talbot0
Didier Dutartre0
Laurent Rubaldo0
Date of Patent
August 17, 2010
0Patent Application Number
117047990
Date Filed
February 9, 2007
0Patent Primary Examiner
Patent abstract
A method for selectively etching single-crystal silicon-germanium in the presence of single-crystal silicon, including a chemical etch based on hydrochloric acid in gaseous phase at a temperature lower than approximately 700° C.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.