US Patent 7776384 Methods and apparatuses for depositing nanometric filamentary structures

The invention relates to a method for monitoring the production of nanometric filamentary structures. The method comprises passing a gaseous phase comprising nanometric filamentary structures through a space defined between at least two electrodes generating an electric field for causing an increase of current between the electrodes and analyzing behavior of the current over a predetermined period of time and/or analyzing at least one of the size, density and shape of the nanometric filamentary structures or aggregates thereof present in the gaseous phase.