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US Patent 7767022 Method of annealing a sublimation grown crystal

Patent 7767022 was granted and assigned to II-VI Incorporated on August, 2010 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Current Assignee
II-VI Incorporated
II-VI Incorporated
1
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
77670221
Patent Inventor Names
Jihong Chen1
Walter R. M. Stepko1
Avinash K. Gupta1
Edward Semenas1
Ilya Zwieback1
Marcus Getkin1
Date of Patent
August 3, 2010
1
Patent Application Number
117883841
Date Filed
April 19, 2007
1
Patent Citations Received
‌
US Patent 11761117 SiC single crystal sublimation growth apparatus
Patent Primary Examiner
‌
Robert M. Kunemund
1
Patent abstract

A crystal is sublimation grown in a crucible by way of a temperature gradient in the presence of between 1 and 200 Torr of inert gas. The pressure of the inert gas is then increased to between 300 and 600 Torr, while the temperature gradient is maintained substantially constant. The temperature gradient is then reduced and the temperature in the crucible is increased sufficiently to anneal the crystal. Following cooling and removal from the crucible, the crystal is heated in the presence of oxygen in an enclosure to a temperature sufficient to remove unwanted material from the crystal. Following cooling and removal from the enclosure, the crystal surrounded by another instance of the source material is heated in a crucible in the presence 200 and 600 Torr of inert gas to a temperature sufficient to anneal the crystal.

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