Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Masahiko Ogino0
Souichi Katagiri0
Yasunari Sohda0
Date of Patent
June 29, 2010
Patent Application Number
11626402
Date Filed
January 24, 2007
Patent Citations Received
Patent Primary Examiner
Patent abstract
Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
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