Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Duk Lee0
Jun Ishikawa0
Date of Patent
June 22, 2010
0Patent Application Number
121483390
Date Filed
April 18, 2008
0Patent Primary Examiner
Patent abstract
The present invention presents an exposure device, which includes an optical source for emitting a UV ray, a lighting system for shaping the UV ray into a collimated light beam, an aperture member for producing rectangular first and second light beams based on the light beam from lighting system by using the first and second rectangular windows, first and second spatial light modulators for spatially modulating the first and second light beams, respectively, and first and second projection lighting systems for guiding the modulated first and second light beams to the object.
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