Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
June 22, 2010
Patent Application Number
11804082
Date Filed
May 17, 2007
Patent Primary Examiner
Patent abstract
A precious metal sputter target has a composition selected from the group consisting of platinum, palladium, rhodium, iridium, ruthenium, osmium and single-phase alloys thereof. The sputter target's grain structure is at least about 99 percent recrystallized and has a grain size of less than about 200 μm for improving sputter uniformity. The cryogenic method for producing these sputter targets is also effective for improving sputter performance for silver an gold sputter targets.
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