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US Patent 7735452 Sensor for pulsed deposition monitoring and control

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Patent
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Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
77354521
Patent Inventor Names
Martin Spartz1
Date of Patent
June 15, 2010
1
Patent Application Number
111778351
Date Filed
July 8, 2005
1
Patent Primary Examiner
‌
Ram N Kackar
1
Patent abstract

Delivery of gas by a pulsed gas delivery device is monitored using a sensor. The sensor may include a source that generates radiation at a spectral range that includes an absorption frequency of the gas being delivered. The radiation is transmitted through a receptacle into which the delivered gas has been received. A detector detects the intensity of the radiation that reaches the detector from the source after transmission through the gas in the receptacle. A controller measures a precise quantity of the gas that was delivered by the gas delivery device, by determining from the detected intensity the amount of the radiation that was absorbed by the gas in the receptacle. The controller monitors in real time the delivery of the gas, by adaptively adjusting the quantity of gas being delivered to a desired quantity. The sensor and controller can also monitor for failures or for out-of-specification behavior of the gas delivery device.

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