Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 18, 2010
Patent Application Number
12038846
Date Filed
February 28, 2008
Patent Primary Examiner
Patent abstract
An integrated circuit includes a first electrode, a second electrode, and dielectric material including an opening. The opening is defined by etching the dielectric material based on an oxidized polysilicon mask formed using a keyhole process. The integrated circuit includes resistivity changing material deposited in the opening and coupled between the first electrode and the second electrode.
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