Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 4, 2010
Patent Application Number
12009889
Date Filed
January 23, 2008
Patent Primary Examiner
Patent abstract
A device in miniature and fabrication of such a device for interferometric use is described, the device including a substrate with at least one deep reactive ion etching structure on at least one surface of the substrate forming an optical bench. The optical bench preferably comprises a moving stage, an actuator, one or more connector sockets and one or more optical components.
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