Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 27, 2010
Patent Application Number
10905587
Date Filed
September 12, 2005
Patent Primary Examiner
Patent abstract
A method of selectively forming a germanium structure within semiconductor manufacturing processes removes the native oxide from a nitride surface in a chemical oxide removal (COR) process and then exposes the heated nitride and oxide surface to a heated germanium containing gas to selectively form germanium only on the nitride surface but not the oxide surface.
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