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US Patent 7700491 Stringer elimination in a BiCMOS process

Patent 7700491 was granted and assigned to Agere Systems on April, 2010 by the United States Patent and Trademark Office.

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Patent
Patent
1

Patent attributes

Current Assignee
Agere Systems
Agere Systems
1
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
77004911
Patent Inventor Names
Mario Pita1
Thomas M. Oberdick1
Thomas Craig Esry1
Daniel Charles Kerr1
Milton Beachy1
Date of Patent
April 20, 2010
1
Patent Application Number
112010391
Date Filed
August 10, 2005
1
Patent Primary Examiner
‌
Anita K Alanko
1
Patent abstract

A method of preventing formation of stringers adjacent a side of a CMOS gate stack during the deposition of mask and poly layers for the formation of a base and emitter of a bi-polar device on a CMOS integrated circuit wafer. The stringers are formed by incomplete removal of a hard mask layer over an emitter poly layer over a nitride mask layer. The method includes overetching the hard mask layer with a first etchant having a higher selectivity for the emitter poly material than for the material of the hard mask, determining an end point for the overetching step by detection of nitride in the etchant and applying a poly etchant that is selective with respect to nitride to remove any residual emitter poly.

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