Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 13, 2010
Patent Application Number
11637165
Date Filed
December 12, 2006
Patent Primary Examiner
Patent abstract
A semiconductor device and a method for manufacturing the same are provided. A barrier film is formed in a device separating structure, and the device separating structure is etched at a predetermined thickness to expose a semiconductor substrate. Then, a SEG film is grown to form an active region whose area is increased. As a result, a current driving power of a transistor located at a cell region and peripheral circuit regions is improved.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
