Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jiro Inoue0
Masaaki Nojiri0
Koichi Hayakawa0
Date of Patent
April 13, 2010
0Patent Application Number
115949850
Date Filed
November 9, 2006
0Patent Primary Examiner
Patent abstract
The via chain conduction failure due to non-conduction caused by insufficient etching in a contact plug/via plug forming process can be detected precisely in a short time. For its achievement, a defect is detected at high speed by taking advantage of characteristics of a potential contrast method using a via chain defect inspection structure and an electron beam defect detection apparatus which can perform continuous inspection while changing an inspection direction without rotating a wafer. Accordingly, the capturing efficiency of a critical electric defect and search efficiency of a defect point can be improved.
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