US Patent 7687406 Methods of eliminating pattern collapse on photoresist patterns
Patent 7687406 was granted and assigned to Micron Technology on March, 2010 by the United States Patent and Trademark Office.
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A stabilizing solution for treating photoresist patterns and methods of preventing profile abnormalities, toppling and resist footing are disclosed. The stabilizing solution comprises a non-volatile component, such as non-volatile particles or polymers, which is applied after the photoresist material has been developed. By treating the photoresist with the solution containing a non-volatile component after developing but before drying, the non-volatile component fills the space between adjacent resist patterns and remains on the substrate during drying. The non-volatile component provides structural and mechanical support for the resist to prevent deformation or collapse by liquid surface tension forces.
US Patent 07687406 Methods of eliminating pattern collapse on photoresist patterns US Patent 7687406 Methods of eliminating pattern collapse on photoresist patterns
US Patent 07687406 Methods of eliminating pattern collapse on photoresist patterns
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