US Patent 7684611 Photoresist edge bead removal measurement

Patent 7684611 was granted and assigned to Rudolph Technologies, Inc. on March, 2010 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

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Rudolph Technologies, Inc.

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7684611

Patent Inventor Names

Patrick Simpkins0

Date of Patent

March 23, 2010

Patent Application Number

11676140

Date Filed

February 16, 2007

Patent Primary Examiner

Charles Kim

Patent abstract

An edge bead removal measurement method includes determining an edge of a wafer about a circumference of the wafer. A location of a wafer notch on the edge of the wafer is determined. A location of a center of the wafer is determined. A distance from the edge of the wafer to an edge bead removal line about the circumference of the wafer is determined.