US Patent 7676295 Processing information management in a plasma processing tool

A computer-implemented method for managing substrate processing data. Substrate process data is acquired while a substrate is processed in a plasma-processing chamber of a cluster tool. The method includes receiving meta-data that identifies at least one of an identification of the substrate and a process. The method further includes receiving from transducers process data streams, each of the process data streams pertaining to a process parameter being monitored. Individual data items in each of the process data streams are being collected in accordance to one of a first methodology and a second methodology. The first methodology represents data collection that is periodic in time. The second methodology represents data collection that happens when predefined events occur. The method also includes storing individual data items associated with process data streams in a single file. The single file stores only data pertaining to a single recipe used to process the substrate.