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US Patent 7675201 Lithographic apparatus with planar motor driven support

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Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7675201
Patent Inventor Names
Hans Butler1
Franciscus Adrianus Gerardus Klaassen1
Date of Patent
March 9, 2010
Patent Application Number
11492215
Date Filed
July 25, 2006
Patent Primary Examiner
‌
Quyen Leung
Patent abstract

A lithographic apparatus includes an illumination system that conditions a radiation beam, a patterning support holding a patterning device that patterns the radiation beam, a substrate support to hold a substrate, a projection system to project the patterned radiation beam onto the substrate, an additional support, and a flexible line assembly to transfer at least one of a current, a signal or a fluid. A first part of the line assembly extends between a base and the additional support, and a second part extends between the additional support and the patterning support or the substrate support. A first motor assembly generates a force in at least one direction, and is coupled to the one of either the patterning support or the substrate support. A second motor assembly generates a force in the at least one direction, and is coupled to the additional support. The first motor assembly includes a planar motor.

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