Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tsutomu Sasaki0
Date of Patent
March 2, 2010
0Patent Application Number
117014810
Date Filed
February 2, 2007
0Patent Primary Examiner
Patent abstract
A method of manufacturing a patterned film by which an accurately patterned film is formed when film formation is performed by using the AD method. The method includes the steps of: (a) disposing a multilayered mask containing at least one soft mask layer formed of a soft material and at least one hard mask layer formed of a hard material on a substrate or an electrode formed on the substrate; (b) spraying powder formed of a brittle material toward the substrate, on which the multilayered mask has been disposed, and allowing the powder to collide with an under layer to deposit the powder thereon, thereby forming a brittle material layer; and (c) removing the multilayered mask after step (b).
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
