US Patent 7670646 Methods for atomic-layer deposition
Patent 7670646 was granted and assigned to Micron Technology on March, 2010 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
January 5, 2007
0
Date of Patent
March 2, 2010
0
Patent Application Number
11620324
0
Patent Inventor Names
Leonard Forbes
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Kie Y. Ahn
0
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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