Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
February 16, 2010
Patent Application Number
11320858
Date Filed
December 30, 2005
Patent Primary Examiner
Patent abstract
The present invention efficiently suppresses a false defect and realizes reticle inspection where a defect can be detected with high detection sensitivity. In a reticle inspecting method, reticle inspection data generated based on reticle design data is captured. Also, drawing position accuracy measurement data of the reticle is captured to obtain a first correction amount for correcting a position accuracy component of the reticle. Based on the first correction amount, the inspection data is corrected. Based on the corrected inspection data, a defect on the reticle is detected.
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