US Patent 7655574 Method of modifying insulating film

Patent 7655574 was granted and assigned to Tokyo Electron on February, 2010 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Tokyo Electron

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7655574

Date of Patent

February 2, 2010

Patent Application Number

11289330

Date Filed

November 30, 2005

Patent Primary Examiner

‌

Chuong A Luu

Patent abstract

An insulting film is modified by subjecting the insulting film to a modification treatment comprising a combination of a plasma treatment and a thermal annealing treatment. There is provided a method of enhancing the characteristic of an insulating film by improving deterioration in the characteristic of the insulating film due to carbon, a suboxide, a dangling bond or the like contained in the insulating film.