US Patent 7651776 Curing resin composition cured film and antireflection film

Patent 7651776 was granted and assigned to Nitto Denko on January, 2010 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Nitto Denko

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7651776

Date of Patent

January 26, 2010

Patent Application Number

10535681

Date Filed

November 17, 2003

Patent Primary Examiner

‌

Holly Rickman

Patent abstract

A curing resin composition which enables formation of an antireflection layer having good antiscratchability and a cured film obtained from such a curing resin composition are disclosed. The curing resin composition contains (A) a siloxane oligomer having an average molecular weight of 500-10000 in terms of ethylene glycol and (B) a fluorine compound having a number-average molecular weight of 5000 or more in terms of polystyrene and having a fluoroalkyl structure and a polysiloxane structure.