Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kuo-Liang Wei0
Date of Patent
January 19, 2010
0Patent Application Number
116944370
Date Filed
March 30, 2007
0Patent Primary Examiner
Patent abstract
A method of manufacturing an L-shaped spacer is described. First, a substrate is provided and a protruding structure is formed thereon. Next, a dielectric material is formed on the substrate and covers the stacked structure. Then, the dielectric material on the top of the protruding structure and on portions of the substrate is removed to form an L-shaped spacer.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
