US Patent 7638781 Local pressure sensing in a plasma processing system

Patent 7638781 was granted and assigned to Varian Semiconductor Equipment Associates on December, 2009 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Varian Semiconductor Equipment Associates

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

76387810

Patent Inventor Names

Steven R. Walther0

Harold M. Persing0

Date of Patent

December 29, 2009

Patent Application Number

118603330

Date Filed

October 22, 2007

Patent Primary Examiner

‌

David A. Vanore

Patent abstract

A plasma processing system includes a process chamber, a source configured to generate a plasma in the process chamber, a platen configured to support a workpiece in the process chamber, and a pressure sensor positioned adjacent to the workpiece. The pressure sensor is configured to monitor a local pressure adjacent to the workpiece. A method includes generating a plasma in a process chamber, supporting a workpiece in the process chamber, and monitoring a local pressure adjacent to the workpiece with a pressure sensor positioned adjacent to the workpiece.