US Patent 7635502 ALD apparatus and method

Patent 7635502 was granted and assigned to Sundew Technologies on December, 2009 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Sundew Technologies

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

76355020

Patent Inventor Names

Ofer Sneh0

Date of Patent

December 22, 2009

Patent Application Number

110767720

Date Filed

March 10, 2005

Patent Primary Examiner

‌

Timothy Meeks

Patent abstract

An apparatus and method for atomic layer deposition with improved efficiency of both chemical dose and purge is presented. The apparatus includes an integrated equipment and procedure for chamber maintenance.

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