US Patent 7628864 Substrate cleaning apparatus and method
Patent 7628864 was granted and assigned to Tokyo Electron on December, 2009 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
April 27, 2005
Date of Patent
December 8, 2009
Patent Application Number
11115358
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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