US Patent 7622378 Multi-step system and method for curing a dielectric film

Patent 7622378 was granted and assigned to Tokyo Electron on November, 2009 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Tokyo Electron

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7622378

Date of Patent

November 24, 2009

Patent Application Number

11269581

Date Filed

November 9, 2005

Patent Primary Examiner

‌

Alexander G Ghyka

Patent abstract

A multi-step system and method for curing a dielectric film in which the system includes a drying system configured to reduce the amount of contaminants, such as moisture, in the dielectric film. The system further includes a curing system coupled to the drying system, and configured to treat the dielectric film with ultraviolet (UV) radiation and infrared (IR) radiation in order to cure the dielectric film.