US Patent 7608539 ALD method and apparatus

Patent 7608539 was granted and assigned to Sundew Technologies on October, 2009 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Sundew Technologies

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

76085390

Patent Inventor Names

Ofer Sneh0

Date of Patent

October 27, 2009

Patent Application Number

118204600

Date Filed

June 18, 2007

Patent Primary Examiner

‌

Michael Kornakov

Patent abstract

A method and an apparatus for executing efficient and cost-effective Atomic Layer Deposition (ALD) at low temperatures are presented. ALD films such as oxides and nitrides are produced at low temperatures under controllable and mild oxidizing conditions over substrates and devices that are moisture- and oxygen-sensitive. ALD films, such as oxides, nitrides, semiconductors and metals, are efficiently and cost-effectively deposited from conventional metal precursors and activated nonmetal sources. Additionally, substrate preparation methods for optimized ALD are disclosed.