Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 13, 2009
Patent Application Number
12059444
Date Filed
March 31, 2008
Patent Primary Examiner
Patent abstract
An exposure apparatus, which equipped with a projection optical system that is configured to project a pattern of an original onto a substrate, includes an interferometer configured to measure a wavefront in a first direction and a wavefront in a second direction of light passed through the projection optical system; a focus detecting unit configured to detect focus positions in the first and second directions of the projection optical system; and a calculating unit configured to calculate wavefront aberration of the projection optical system on the basis of the measurement result of the interferometer and the detection result of the focus detecting unit.
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