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US Patent 7601619 Method and apparatus for plasma processing

Patent 7601619 was granted and assigned to Panasonic on October, 2009 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Current Assignee
Panasonic
Panasonic
Date Filed
April 4, 2006
Date of Patent
October 13, 2009
Patent Application Number
11887821
Patent Citations Received
‌
US Patent 11689107 Nanosecond pulser bias compensation
3
‌
US Patent 11875971 Efficient energy recovery in a nanosecond pulser circuit
4
‌
US Patent 11670484 Variable output impedance RF generator
5
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7601619
Patent Primary Examiner
‌
Savitri Mulpuri

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