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US Patent 7601240 Disturbance-free, recipe-controlled plasma processing system and method

Patent 7601240 was granted and assigned to Hitachi on October, 2009 by the United States Patent and Trademark Office.

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Patent
Patent

Patent attributes

Current Assignee
Hitachi
Hitachi
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7601240
Patent Inventor Names
Toshio Masuda1
Kenji Tamaki1
Natsuyo Morioka1
Shoji Ikuhara1
Akira Kagoshima1
Hideyuki Yamamoto1
Hiroyuki Kitsunai1
Junichi Tanaka1
Date of Patent
October 13, 2009
Patent Application Number
11346298
Date Filed
February 3, 2006
Patent Primary Examiner
‌
Ram N Kackar
Patent abstract

A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in the first unit. A next sample is plasma processed in the first unit based on the modified recipe.

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