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US Patent 7601240 Disturbance-free, recipe-controlled plasma processing system and method

Patent 7601240 was granted and assigned to Hitachi on October, 2009 by the United States Patent and Trademark Office.

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Patent Inventor Names
Akira Kagoshima1
Hideyuki Yamamoto1
Hiroyuki Kitsunai1
Junichi Tanaka1
Kenji Tamaki1
Natsuyo Morioka1
Shoji Ikuhara1
Toshio Masuda1
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Patent abstract

A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in the first unit. A next sample is plasma processed in the first unit based on the modified recipe.

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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=07601240
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US Patent 07601240 Disturbance-free, recipe-controlled plasma processing system and method US Patent 7601240 Disturbance-free, recipe-controlled plasma processing system and method

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Patent Number
07601240
Patent Number
7601240
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=07601240
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 US Patent 07601240 Disturbance-free, recipe-controlled plasma processing system and method

Infobox
Is a
Patent
Patent
Current assignee
Hitachi
Hitachi
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
07601240
Date of patent
October 13, 2009
Patent application number
11346298
Date Filed
February 3, 2006
Patent primary examiner
‌
Ram N Kackar

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