US Patent 7601240 Disturbance-free, recipe-controlled plasma processing system and method

Patent 7601240 was granted and assigned to Hitachi on October, 2009 by the United States Patent and Trademark Office.

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Patent Inventor Names

Akira Kagoshima0

Hideyuki Yamamoto0

Hiroyuki Kitsunai0

Junichi Tanaka0

Kenji Tamaki0

Natsuyo Morioka0

Shoji Ikuhara0

Toshio Masuda0

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Patent abstract

A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in the first unit. A next sample is plasma processed in the first unit based on the modified recipe.

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https://pdfpiw.uspto.gov/.piw?Docid=07601240

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