Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 1, 2009
Patent Application Number
11331552
Date Filed
January 13, 2006
Patent Primary Examiner
Patent abstract
An exemplary method includes: providing a substrate with exposed metal and dielectric surfaces, performing a reducing process on the metal and dielectric surfaces, and transferring the substrate in an inert or reducing ambient to a chamber for that is used for selective metal layer deposition.
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