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US Patent 7576968 Plated terminations and method of forming using electrolytic plating

Patent 7576968 was granted and assigned to AVX on August, 2009 by the United States Patent and Trademark Office.

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Patent
Patent

Patent attributes

Current Assignee
‌
AVX
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7576968
Date of Patent
August 18, 2009
Patent Application Number
11503402
Date Filed
August 10, 2006
Patent Citations Received
‌
US Patent 12112891 Multilayer capacitor and circuit board containing the same
0
Patent Primary Examiner
‌
Nguyen T. Ha
Patent abstract

A multilayer electronic component includes a plurality of dielectric layers interleaved with a plurality of internal electrodes. Internal and/or external anchor tabs may also be selectively interleaved with the dielectric layers. Portions of the internal electrodes and anchor tabs are exposed along the periphery of the electronic component in respective groups. Each exposed portion is within a predetermined distance from other exposed portions in a given group such that termination structures may be formed by deposition and controlled bridging of a thin-film plated material among selected of the exposed internal conductive elements. Electrolytic plating may be employed in conjunction with optional cleaning and annealing steps to form directly plated portions of copper, nickel or other conductive material. Once an initial thin-film metal is directly plated to a component periphery, additional portions of different materials may be plated thereon.

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