US Patent 7576341 Lithography systems and methods for operating the same
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Patent abstract
A lithography system and method for operating the same. The lithography system may include a cathode adapted to emit an electron beam, a beam-homogenizing structure, capable of increasing at least one of the uniformity and energetic of the electron beam, and a mask adapted to accelerate the electron beam to form a pattern on a wafer.
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US Patent 07576341 Lithography systems and methods for operating the same US Patent 7576341 Lithography systems and methods for operating the same
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Patent Number
0757634100
Patent Number
757634100
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Patent Jurisdiction
Patent Number
075763410
Date of Patent
August 18, 2009
0Patent Application Number
112962330
Date Filed
December 8, 2005
0Official Website
Patent Primary Examiner
Edits on 26 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
075763410
Date of Patent
August 18, 2009
0Patent Application Number
112962330
Date Filed
December 8, 2005
0Official Website
Patent Primary Examiner
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US Patent 07576341 Lithography systems and methods for operating the same
Infobox
Is a
Patent jurisdiction
Patent number
07576341
Date of patent
August 18, 2009
Patent application number
11296233
Date Filed
December 8, 2005
Patent primary examiner
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