Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Robert P. Meagley0
Kevin P. O'Brien0
Michael D. Goodner0
Date of Patent
August 11, 2009
0Patent Application Number
114176150
Date Filed
May 3, 2006
0Patent Primary Examiner
Patent abstract
Several techniques are described for modulating the etch rate of a sacrificial light absorbing material (SLAM) by altering its composition so that it matches the etch rate of a surrounding dielectric. This particularly useful in a dual damascene process where the SLAM fills a via opening and is etched along with a surrounding dielectric material to form trenches overlying the via opening.
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