Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Osamu Nakamura0
Date of Patent
June 30, 2009
0Patent Application Number
108091180
Date Filed
March 25, 2004
0Patent Primary Examiner
Patent abstract
An island-like interlayer insulating film is formed selectively in a region where a source interconnection and a gate interconnection intersect. For example, by use of ink jet method, a solution containing an insulating material is dropped on a region where the gate interconnection and the source interconnection intersect or a region where a holding capacitor is formed, that enable to reduce a photolithography process and to reduce the number of masks that are used in a TFT.
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