Patent 7553776 was granted and assigned to Purdue Research Foundation on June, 2009 by the United States Patent and Trademark Office.
The present invention provides a method for preparing a silicon substrate and a silicon substrate having a silicon surface comprising a pattern of covalently bound monolayers. Each of the monolayers comprises an alkyne, wherein at least a portion of each monolayer is no more than about 5 molecules of the alkyne wide.