US Patent 7550385 Amine-free deposition of metal-nitride films
Patent 7550385 was granted and assigned to intel (company) on June, 2009 by the United States Patent and Trademark Office.
Is a
Date Filed
September 30, 2005
Date of Patent
June 23, 2009
Patent Application Number
11240005
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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