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US Patent 7547003 Vaporizing apparatus and semiconductor processing system

Patent 7547003 was granted and assigned to Tokyo Electron on June, 2009 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Current Assignee
Tokyo Electron
Tokyo Electron
1
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
75470031
Patent Inventor Names
Tsuneyuki Okabe1
Shigeyuki Okura1
Date of Patent
June 16, 2009
1
Patent Application Number
118926621
Date Filed
August 24, 2007
1
Patent Citations Received
‌
US Patent 11970771 Vaporizer, substrate processing apparatus and method for manufacturing semiconductor device
2
Patent Primary Examiner
‌
Richard L. Chiesa
1
Patent abstract

A vaporizing apparatus for generating a process gas from a liquid material includes a vaporizing container defining a vaporizing space of the vaporizing apparatus; an injector connected to the vaporizing container to spray the liquid material in an atomized state into the vaporizing space; and a heater attached to the vaporizing container to heat the liquid material sprayed in the vaporizing space. The vaporizing apparatus further includes a gas delivery passage connected to the vaporizing container to output from the vaporizing space a generation gas generated from the liquid material; a filter disposed inside the gas delivery passage or between the gas delivery passage and the vaporizing space to trap mist contained in the generation gas; and an infrared irradiation mechanism configured to irradiate the filter with infrared rays.

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