US Patent 7528075 Self-masking defect removing method

Patent 7528075 was granted and assigned to Hrl Laboratories, Llc on May, 2009 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Hrl Laboratories, Llc

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

75280750

Patent Inventor Names

Peter D. Brewer0

Date of Patent

May 5, 2009

Patent Application Number

107872760

Date Filed

February 25, 2004

Patent Primary Examiner

‌

Thanhha Pham

Patent abstract

A method for removing defects from a semiconductor surface is disclosed. The surface of the semiconductor is first coated with a protective layer, which is later thinned to selectively reveal portions of the protruding defects. The defects are then removed by etching. Finally, also the protective layer is removed. According to the method, inadvertent thinning of the surface is prevented and removal of the defects is obtained.