Patent attributes
When a domain inversion part is produced by means of electric field polling process, damage in the vicinity of the forward end of a comb electrode and deviation of width of each domain inversion part are to be reduced. A polarization domain inversion structure has polarization domain inversion parts is produced by electric field poling process using a comb electrode formed on one surface of a substrate of a ferroelectric single crystal and of a single domain, and the comb electrode has a plurality of electrode portions and feeding portion. Each of the electrode portions corresponds with each domain inversion part of the domain inversion structure. The electrode portion has a plurality of low resistance pieces arranged in a direction “F” intersecting the longitudinal direction “E” of the electrode portion and spaced apart with each other.
