Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 21, 2009
Patent Application Number
11745610
Date Filed
May 8, 2007
Patent Primary Examiner
Patent abstract
Conductive sidewall spacer structures are formed using a method that patterns structures (mandrels) and activates the sidewalls of the structures. Metal ions are attached to the sidewalls of the structures and these metal ions are reduced to form seed material. The structures are then trimmed and the seed material is plated to form wiring on the sidewalls of the structures.
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