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US Patent 7501145 High throughput continuous pulsed laser deposition process

Patent 7501145 was granted and assigned to Superpower Inc. on March, 2009 by the United States Patent and Trademark Office.

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Patent
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Current Assignee
‌
Superpower Inc.
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7501145
Date of Patent
March 10, 2009
Patent Application Number
11554428
Date Filed
October 30, 2006
Patent Citations Received
‌
US Patent 11850620 Coating of samples for microscopy
3
Patent Primary Examiner
‌
Bret Chen
Patent abstract

A method includes feeding an uncoated substrate from a payout spool into a multi-chambered vacuum apparatus. The vacuum apparatus includes a plurality of deposition chambers defining an extended deposition zone, a multi-zone substrate heater located within the extended deposition zone, and multiple high-temperature superconductor (HTS) targets located within and being arranged linearly along the extended deposition zone. The multiple HTS targets include a first and second HTS target. The first and second HTS targets include a HTS material. The method farther includes translating the uncoated substrate along a translation path through the plurality of deposition chambers, impinging multiple laser beams simultaneously upon the multiple HTS targets and forming multiple overlapping plumes of HTS material within the extended deposition zone, depositing HTS material on a first major surface of the uncoated substrate to provide a coated substrate, and winding the coated substrate onto a take-up spool.

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