US Patent 7492442 Adjustable resolution interferometric lithography system
Patent 7492442 was granted and assigned to ASML Holding on February, 2009 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
August 27, 2004
Date of Patent
February 17, 2009
Patent Application Number
10927309
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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