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US Patent 7479509 Low dielectric organosilicate polymer composite

Patent 7479509 was granted and assigned to POSTECH on January, 2009 by the United States Patent and Trademark Office.

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Current Assignee
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POSTECH
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
74795090
Patent Inventor Names
Byeongdu Lee0
Yong Taek Hwang0
Weontae Oh0
Moonhor Ree0
Date of Patent
January 20, 2009
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Patent Application Number
105308150
Date Filed
August 20, 2004
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Patent Primary Examiner
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Mark Eashoo
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Patent abstract

Provided are a porous organosilicate polymer composite prepared by heating an organic/inorganic hybrid polymer in which an organosilicate polymer is chemically bonded to a radial pore-forming polymer ended with a hydrolyzable alkoxysilyl group and used as a core molecule, and a semiconductor device using an organosilicate polymer composite film including the porous organosilicate polymer composite. The organosilicate polymer composite film has a very low dielectric constant, and thus, is useful as a dielectric film of the semiconductor device.

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