US Patent 7476887 EUV light source optical elements

Patent 7476887 was granted and assigned to Cymer on January, 2009 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Cymer

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

74768870

Date of Patent

January 13, 2009

Patent Application Number

117259400

Date Filed

March 19, 2007

Patent Primary Examiner

‌

Bernard E Souw

Patent abstract

Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.