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US Patent 7467632 Method for forming a photoresist pattern

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Patent Citations Received

US Patent 11932905 Amplification oligonucleotides

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Patent Citations Received

US Patent 11884977 Nanoarrays and methods of use thereof

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Patent Citations Received

US Patent 11859244 Amplification oligonucleotides

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Patent Citations Received

US Patent 11802307 Amplification oligonucleotides

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Patent Inventor Names

Cheol Kyu Bok0

Geun Su Lee0

Edits on 15 Sep, 2023

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Patent abstract

A photoresist cleaning solution and method for forming photoresist patterns using the same. More specifically, disclosed are a photoresist cleaning solution comprising H2O and an ionic surfactant represented by Formula 1, and a method for forming a photoresist pattern using the same. By spraying the cleaning solution of the present invention over photoresist film before and/or after exposing step, pattern formation in an undesired region caused by ghost images can be removed.

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=074676320

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US Patent 07467632 Method for forming a photoresist pattern US Patent 7467632 Method for forming a photoresist pattern

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Patent Number

074676320

Patent Number

74676320

Edits on 24 Sep, 2022

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Is a

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Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

074676320

Date of Patent

December 23, 2008

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Patent Application Number

116501410

Date Filed

January 4, 2007

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=074676320

Patent Primary Examiner

Gregory R. Del Cotto

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Edits on 14 Jun, 2022

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Website URL

https://pdfpiw.uspto.gov/.piw?Docid=07467632

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US Patent 07467632 Method for forming a photoresist pattern

Infobox

Is a

Patent jurisdiction

United States Patent and Trademark Office

Patent number

07467632

Date of patent

December 23, 2008

Patent application number

11650141

Date Filed

January 4, 2007

Patent primary examiner

Gregory R. Del Cotto

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